Microwave plasma-induced growth of vertical graphene from fullerene soot
2021
Wang, Zhipeng | Li, Yipei | Liu, Jian | Tian, Gui | Liu, Gang | Wang, Mingxi | Ogata, Hironori | Gong, Wei | Vipin, Adavan Kiliyankil | Hong Melvin, Gan Jet | Ortiz Medina, Josué | Morimoto, Shingo | Hashimoto, Yoshio | Terrones, M. (Mauricio) | Endo, Morinobu
Vertical graphene (VG) films can be fabricated on the surface of nickel foil from fullerene soot (FS) under microwave plasma irradiation (MPI) in a mixture gas of H₂ and Ar at 1200 W for 15 min. The resulting FS-derived VG films mostly consist of few-layer graphene sheets with large domain graphene sizes, high graphitization order, and high purity, as characterized by scanning and transmission electron microscopies, Raman spectroscopy, and X-ray photoelectron spectroscopy. Combined the present and previous results, MPI technique is an effective and versatile approach to synthesize vertically oriented graphene sheets from any carbon-containing sources.
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