Solvent Tolerance Mechanisms in Shewanella putrefaciens IBBPo6

Shewanella putrefaciens IBBPₒ₆(KM405339) showed good tolerance to 5 % organic solvents. The growth was higher when S. putrefaciens IBBPₒ₆cells were exposed to n-decane, as compared with the growth of cells exposed to toluene, o-xylene, ethylbenzene, cyclohexane, or n-hexane. Thus, n-decane was less toxic for S. putrefaciens IBBPₒ₆cells, while toluene, o-xylene, ethylbenzene, cyclohexane, and n-hexane were more toxic for this bacterium. The release of nucleic acids was higher when S. putrefaciens IBBPₒ₆cells were exposed to toluene, o-xylene, ethylbenzene, cyclohexane, or n-hexane, as compared with the release of nucleic acids from control cells and n-decane exposed cells. The cell surface hydrophobicity increased when S. putrefaciens IBBPₒ₆cells were exposed to n-decane, while in the presence of toluene, o-xylene, ethylbenzene, cyclohexane, and n-hexane, a decrease in the cell surface hydrophobicity was acquired. The exposure of S. putrefaciens IBBPₒ₆cells to 5 % organic solvents had induced biofilms formation, and their structure differs according to the nature of the hydrophobic substrate. Two secondary metabolites (i.e., biosurfactants, carotenoids) were produced by S. putrefaciens IBBPₒ₆control cells, as well as by the cells exposed to 5 % organic solvents. S. putrefaciens IBBPₒ₆possesses alkB1 and alkM1 catabolic genes and HAE1 transporter gene. A homologue of otsA1 gene was also detected in this bacterium. Some differences between the polymerase chain reaction (PCR) patterns of S. putrefaciens IBBPₒ₆control cells and cells exposed to 5 % organic solvents were observed. Distinct repetitive sequence-based PCR (rep-PCR), random amplification of DNA fragments (RAPD), and amplified ribosomal DNA restriction analysis (ARDRA) patterns were also acquired in S. putrefaciens IBBPₒ₆cells exposed to 5 % organic solvents, compared with the control cells.