Work Function Dependence of Vibrational Relaxation Probabilities: NO(v = 2) Scattering from Ultrathin Metallic Films of Ag/Au(111)
2018
Steinsiek, Christoph | Shirhatti, Pranav R. | Geweke, Jan | Bartels, Christof | Wodtke, Alec M.
We present measurements on the vibrational relaxation of NO(v = 2) scattered from atomically defined thin films of Ag on Au(111). The vibrational relaxation probability is strongly dependent on film thickness, increasing with each of the first three Ag monolayers. We interpret this as the influence of work function which changes with layer thickness. This supports the postulated mechanism of NO vibrational relaxation involving a transient NO– anion.
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