Amelioration of Salt-Induced Damage on <i>Paeonia ostii</i> ‘Fengdan’ by Exogenous Application of Silicon
Xinlong Shi | Xian Xue | Huimin Xu | Yueqin Yang | Zuoxiang Kuang | Xiaogai Hou
To investigate the amelioration of salt-induced damage on <i>Paeonia ostii</i> ‘Fengdan’ by exogenous silicon, we analyzed the photosynthetic and physiological characteristics of 1.5-year-old ‘Fengdan’ seedlings under NaCl stress by applying exogenous silicon (0, 0.75, and 1.5 mmol/L). Our results showed that the contents of the photosynthetic pigments chlorophyll <i>a</i>, chlorophyll <i>b</i>, and carotene, the transpiration rate, stomatal conductance, and intercellular CO<sub>2</sub> were significantly enhanced under salt stress when silicon treatment was applied, implying that the net photosynthetic rate was greatly improved. In addition, the plant height, stem thickness, and above-ground dry biomass of tree peony seedlings were effectively increased under salt stress with low-concentration silicon (0.75 mmol/L) treatment, along with osmotic substance (SS, SP, and Pro) content, total polyamine (TP) contents, and the activities of antioxidant-related enzymes (SOD, POD, and CAT) and polyamine-related synthetases (ADC, ODC, and SAMDC). In the low-concentration silicon treatment, malondialdehyde (MDA), hydrogen peroxide (H<sub>2</sub>O<sub>2</sub>), and superoxide anions (O<sub>2</sub><sup>−</sup>) were transformed quickly, which eventually reduced cell oxidative damage and improved seedling tolerance. This is an important finding in the understanding of how exogenous low-concentration silicon can alleviate salt-induced damage and promote the growth of tree peony seedlings, thus providing a new perspective on tree peony cultivation.
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