Responses of root growth and yield of soybean [Glycine max] to single basal dressing with slow release fertilizer
2006
Nihei, N.(Fukushima-ken. Agricultural Experiment Station, Koriyama (Japan)) | Tanji, K.
Single basal dressing with controlled availability fertilizer was conducted by co-situs and broadcast application for pot, frame and field cultivation of soybean (cv. Fukuibuki). In the pot experiment, soybean cultivated with the single basal dressing by co-situs application of 70-day-type coated urea had thinner taproots and reduced root weight and root nodule number than the control, which was cultivated with the single basal dressing by broadcast application of chemical fertilizer plus topdressing with 40-day-type coated urea. In the frame experiment with the single basal dressing by broadcast application, nitrogen-use efficiency and the amount of nitrogen uptake from the fertilizer were similar to those in the control plot to which ammonium sulfate was top dressed at flowering stage in addition to basal dressing. However, in the frame experiment with the single basal dressing by co-situs application, the nitrogen-use efficiency and the nitrogen uptake were lower than in the control plot. In the field experiment for two years, yield in the plot with the single basal dressing by either co-situs or broadcast application was lower than that in the control plot. The amount of nitrogen released from availability-controlled fertilizer was considered insufficient for soybean growth, root growth being suppressed in the plot with the basal dressing by co-situs application, and resulting in reduced uptake of nitrogen from the soil.
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