Evaporation-Driven Deposition of WO3 Thin Films from Organic-Additive-Free Aqueous Solutions by Low-Speed Dip Coating and Their Photoelectrochemical Properties
2016
Uchiyama, Hiroaki | Igarashi, Seishirou | Kozuka, Hiromitsu
We prepared tungsten trioxide (WO₃) photoelectrode films from organic-additive-free aqueous solutions by a low-speed dip-coating technique. The evaporation-driven deposition of the solutes occurred at the meniscus during low-speed dip coating, resulting in the formation of coating layer on the substrate. Homogeneous WO₃ precursor films were obtained from (NH₄)₁₀W₁₂O₄₁·5H₂O aqueous solutions and found to be crystallized to monoclinic WO₃ films by the heat treatment at 400–700 °C. All the films showed a photoanodic response irrespective of the heat treatment temperature, where a good photoelectrochemical stability was observed for those heated over 500 °C. The highest photoanodic performance was observed for the WO₃ film heated at 700 °C, where the IPCE (incident photon-to-current efficiency) was 36.2% and 4.6% at 300 and 400 nm, respectively.
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