Gas distribution system for optimization of the technological process of coating in an unbalanced magnetron sputtering installation
Uzunov, Ivan | Lengerov, Angel
The paper proposes a new design solution for regulating the distribution of the working gases in the vacuum chamber of the installation (UDP -850/4) for unbalanced magnetron sputtering, which will improve the mode and quality of application of multilayer nano-coatings. Constructive documentation for manufacturing a gas distribution system has been prepared, as well as instructions for assembly to the vacuum chamber.
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