Gas distribution system for optimization of the technological process of coating in an unbalanced magnetron sputtering installation
Uzunov, Ivan | Lengerov, Angel
The paper proposes a new design solution for regulating the distribution of the working gases in the vacuum chamber of the installation (UDP -850/4) for unbalanced magnetron sputtering, which will improve the mode and quality of application of multilayer nano-coatings. Constructive documentation for manufacturing a gas distribution system has been prepared, as well as instructions for assembly to the vacuum chamber.
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Библиографическая информация
Издатель
Rezekne Academy of Technologies
Нумерация страниц
368-371
Другие темы
Vacuum engineering
Язык
Английский
Примечание
Source : Environment. Technologies. Resources: Proceedings of the 13th International Scientific and Practical Conference. Rezekne, Latvia, June 17th – 18th, 2021. – Volume 3 (2021)
Physical Descript. : 4 figures
Bibliogr. : 10 references
Gen. Note : Online resource
Language Note : Summary in English - Content source: Crossref
Тип
Journal Article; Journal
2023-03-15
AGRIS AP
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