DNA damage in Populus tremuloides clones exposed to elevated O3
2010
Tai, Helen H. | Percy, Kevin E. | Karnosky, David F.
The effects of elevated concentrations of atmospheric tropospheric ozone (O3) on DNA damage in five trembling aspen (Populus tremuloides Michx.) clones growing in a free-air enrichment experiment in the presence and absence of elevated concentrations of carbon dioxide (CO2) were examined. Growing season mean hourly O3 concentrations were 36.3 and 47.3 ppb for ambient and elevated O3 plots, respectively. The 4th highest daily maximum 8-h ambient and elevated O3 concentrations were 79 and 89 ppb, respectively. Elevated CO2 averaged 524 ppm (+150 ppm) over the growing season. Exposure to O3 and CO2 in combination with O3 increased DNA damage levels above background as measured by the comet assay. Ozone-tolerant clones 271 and 8L showed the highest levels of DNA damage under elevated O3 compared with ambient air; whereas less tolerant clone 216 and sensitive clones 42E and 259 had comparably lower levels of DNA damage with no significant differences between elevated O3 and ambient air. Clone 8L was demonstrated to have the highest level of excision DNA repair. In addition, clone 271 had the highest level of oxidative damage as measured by lipid peroxidation. The results suggest that variation in cellular responses to DNA damage between aspen clones may contribute to O3 tolerance or sensitivity. Ozone tolerant clones and sensitive Populus tremuloides clones show differences in DNA damage and repair.
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