Residual organics removal from manganese electrochemical solution using combined Fenton oxidation process with adsorption over activated carbon

Cui, Jingxian; Li, Xueping; Muhammad, Yaseen; Shi, Chongyi; Li, Haibin; Su, Haifeng

Residual organics removal from manganese electrochemical solution using combined Fenton oxidation process with adsorption over activated carbon

2020

The removal of residual organics from manganese (Mn) electrochemical solution using combined Fenton oxidation process with adsorption over activated carbon (AC) was investigated. The effect of operating conditions such as dosage of H₂O₂, H₂O₂/Fe²⁺ ratio, initial pH value, reaction temperature, and reaction time on Fenton oxidation was studied. Experimental results indicated that a maximum chemical oxygen demand (COD) of 83.2% was obtained under the optimized set of conditions: H₂O₂ concentration of 0.15 mol/L, H₂O₂/Fe²⁺ molar ratio of 3, initial pH value of 3, reaction temperature of 50 °C, and reaction time of 90 min. The leaching solution was furthered treated over AC and COD removal rate increased to 93.1% under 3.75 g/L dosage of AC, adsorption temperature of 70 °C, and adsorption time of 120 min. The adsorption mechanism of Mn over AC was detailly investigated, while the porous texture of AC was studied by nitrogen adsorption isotherm.

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