Accelerated bacterial inactivation obtained by HIPIMS sputtering on low cost surfaces with concomitant reduction in the metal/semiconductor content

Rtimi, Sami; Pulgarin, Cesar; Baghriche, Oualid; Kiwi, John

Accelerated bacterial inactivation obtained by HIPIMS sputtering on low cost surfaces with concomitant reduction in the metal/semiconductor content

2013

Rtimi, Sami | Pulgarin, Cesar | Baghriche, Oualid | Kiwi, John

Novel ultrathin TiO₂–Cu nanoparticulate films sputtered by highly ionized pulsed plasma magnetron sputtering (HIPIMS) lead to faster bacterial inactivation compared to more traditional sputtering approaches with an appreciable metal saving. HIPIMS sputtering induces a strong interaction of the TiO₂–Cu-ions (M⁺) with the polyester surface due to the high fraction and density of M⁺-ions interacting with the biased substrate.

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