Catalytic Effect of a Semiconductor on the Removal of Hexavalent Chromium from Aqueous Solution by γ-Ray Irradiation

Fei, Xionghui; Ling, Yongsheng; Shan, Qing; Hei, Daqian; Jia, Wenbao

Catalytic Effect of a Semiconductor on the Removal of Hexavalent Chromium from Aqueous Solution by γ-Ray Irradiation

2017

Fei, Xionghui | Ling, Yongsheng | Shan, Qing | Hei, Daqian | Jia, Wenbao

Hexavalent chromium is a type of toxic chemical, it may cause allergies, hereditary genetic defects and cancer in humans by inhalation, and it is also a persistent danger to the environment. However, chromium metal, trivalent chromium and tetravalent chromium have low toxicities. In this study, semiconductor materials (quartz fibre and TiO₂) were added to a hexavalent chromium solution and the removal efficiency of hexavalent chromium as a function of the γ-ray irradiation dose, as well as the catalytic mechanism, was investigated. It was observed that the reduction of hexavalent chromium by γ-ray irradiation was largely promoted in the presence of semiconductor materials; the semiconductor materials act as catalysts under the gamma-ray irradiation. The hexavalent chromium in the solution can be converted to an insoluble precipitate by gamma-ray irradiation. These results are highly beneficial to apply semiconductor materials as catalysts for the removal of contaminants by radiation.

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