Ti-catalyzed HfSiO4 formation in HfTiO4 films on SiO2 studied by Z-contrast scanning electron microscopy

Elizabeth Ellen Hoppe; Massiel Cristina Cisneros-Morales; Carolyn Rubin Aita

Ti-catalyzed HfSiO4 formation in HfTiO4 films on SiO2 studied by Z-contrast scanning electron microscopy

2013

Elizabeth Ellen Hoppe | Massiel Cristina Cisneros-Morales | Carolyn Rubin Aita

Hafnon (HfSiO4) as it is initially formed in a partially demixed film of hafnium titanate (HfTiO4) on fused SiO2 is studied by atomic number (Z) contrast high resolution scanning electron microscopy, x-ray diffraction, and Raman spectroscopy and microscopy. The results show exsoluted Ti is the catalyst for hafnon formation by a two-step reaction. Ti first reacts with SiO2 to produce a glassy Ti-silicate. Ti is then replaced by Hf in the silicate to produce HfSiO4. The results suggest this behavior is prototypical of other Ti-bearing ternary or higher order oxide films on SiO2 when film thermal instability involves Ti exsolution.

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